Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47390 | 0.81 | KMT2A (0.35) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL119887 | 0.80 | KMT2A (0.34) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL10148640 | 0.80 | KMT2A (0.34) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL2740754 | 0.80 | KMT2A (0.34) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL19978612 | 0.78 | KMT2A (0.33) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL18802878 | 0.77 | MEN1 (0.33) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL106979 | 0.77 | MEN1 (0.32) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL19753662 | 0.77 | MEN1 (0.33) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL22402975 | 0.76 | ALDH1A1 (0.35) | EPHX2MEN1KMT2AMAPK1ALDH1A1 | |
| SCHEMBL25468020 | 0.75 | GLA (0.33) | MEN1KMT2AMAPK1ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |