SCHEMBL10151004

SCHEMBL10151004

C=C(C)C(=O)OC(C)CC(C)C(=O)OC12CC3(C)CC(C)(CC(O)(C3)C1)C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL677974 0.77 ALDH1A1 (0.33)
SCHEMBL12765098 0.76 DPP4 (0.33)
SCHEMBL7133622 0.76 TSHR (0.47) TSHR
SCHEMBL7130970 0.75 TSHR (0.33) TSHR
SCHEMBL685715 0.75 TSHR (0.33) TSHR
SCHEMBL678430 0.74 ALDH1A1 (0.33)
SCHEMBL13645265 0.74 DPP4 (0.30)
SCHEMBL1697075 0.73 THRB (0.36) TSHR
SCHEMBL685641 0.72 TSHR (0.33) TSHR
SCHEMBL12726727 0.72 THRB (0.35) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20110165521-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-07 US disclosed