Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.53 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.36 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26011995 | 0.88 | TSHR (0.51) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL685366 | 0.85 | TSHR (0.53) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL685847 | 0.85 | TSHR (0.53) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL547287 | 0.84 | TSHR (0.52) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL19261603 | 0.84 | TSHR (0.52) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL14035930 | 0.83 | TSHR (0.49) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL24361264 | 0.82 | TSHR (0.51) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL685848 | 0.82 | TSHR (0.51) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL14554274 | 0.82 | TSHR (0.51) | TSHRNPSR1EPHX2CYP19A1CYP17A1 | |
| SCHEMBL10150821 | 0.82 | TSHR (0.51) | TSHRNPSR1EPHX2CYP19A1CYP17A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130022923-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022916-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022916-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120270154-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-25 | — | — | US | disclosed |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-12 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | AFF1, FGFR1, FRG1 | TSHR 834/4885NPSR1 1149/4885EPHX2 2881/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.