Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 13/20 | 0.54 |
| ▸ | PPARA | Q07869 | 2/20 | 0.51 |
| ▸ | PPARG | P37231 | 1/20 | 0.51 |
| ▸ | THRB | P10828 | 2/20 | 0.42 |
| ▸ | LTA4H | P09960 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12737001 | 0.88 | ELANE (0.56) | ELANETHRBKMT2A | |
| SCHEMBL10159815 | 0.86 | ELANE (0.44) | ELANEPPARAPPARG | |
| SCHEMBL12205988 | 0.85 | ELANE (0.53) | ELANETHRBMEN1KMT2A | |
| SCHEMBL10205036 | 0.84 | PPARA (0.56) | ELANEPPARATHRBLTA4HKMT2A | |
| SCHEMBL92310 | 0.84 | ELANE (0.56) | ELANELTA4HMEN1KMT2A | |
| SCHEMBL3657617 | 0.84 | ELANE (0.76) | ELANEPPARAPPARGTHRBLTA4H | |
| SCHEMBL20408446 | 0.84 | ELANE (0.42) | ELANEPPARAPPARGKMT2A | |
| SCHEMBL13706056 | 0.84 | ELANE (0.42) | ELANEPPARAPPARGMEN1KMT2A | |
| SCHEMBL13563645 | 0.82 | ELANE (0.58) | ELANEMEN1KMT2A | |
| SCHEMBL12736997 | 0.82 | ELANE (0.58) | ELANEMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180210338-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-9017923-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140170560-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |