SCHEMBL12737001

SCHEMBL12737001

CCc1ccc(OC(=O)C(C)(C)CC)cc1

nearest known ligand 0.56

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ELANE P08246 9/20 0.56
RAB9A P51151 1/20 0.47
ALDH1A1 P00352 3/20 0.44
RXRA P19793 1/20 0.42
RXRB P28702 1/20 0.42
POLB P06746 1/20 0.42
CYP2C19 P33261 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
PLA2G1B P04054 1/20 0.41
KMT2A Q03164 1/20 0.41
ATG4B Q9Y4P1 1/20 0.41
THRB P10828 1/20 0.40
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10159814 0.88 ELANE (0.54) ELANEKMT2ATHRB
SCHEMBL12205988 0.86 ELANE (0.53) ELANEKMT2ATHRB
SCHEMBL92310 0.85 ELANE (0.56) ELANEALDH1A1KMT2A
SCHEMBL16189796 0.85 ELANE (0.76) ELANERAB9AALDH1A1
SCHEMBL14747377 0.84 ELANE (0.51) ELANESMN1; SMN2KMT2ATDP1
SCHEMBL12736999 0.84 ELANE (0.54) ELANEALDH1A1KMT2A
SCHEMBL13563645 0.84 ELANE (0.58) ELANEALDH1A1POLBSMN1; SMN2KMT2A
SCHEMBL12736997 0.84 ELANE (0.58) ELANERAB9AALDH1A1KMT2ATDP1
SCHEMBL17552767 0.83 ELANE (0.50) ELANETHRB
SCHEMBL17552769 0.83 ELANE (0.50) ELANEPOLBSMN1; SMN2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7923196-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2011-04-12 US disclosed
US-7923196-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2011-04-12 US disclosed
US-20100248146-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
US-20100248146-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
US-20080286673-A1 Single layer type electrophotographic photoconductor and image forming device KYOCERA MITA CORPORATION 2008-11-20 US disclosed
US-7416825-B2 Single layer type electrophotographic photoconductor and image forming device KYOCERA MITA CORPORATION (JP) 2008-08-26 US disclosed