SCHEMBL10163471

SCHEMBL10163471

CCC(C)C(=O)OC1(C(C)CC)C2CC3CC(C2)CC1C3

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
KMT2A Q03164 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17789375 0.90 ALDH1A1 (0.31) ALDH1A1
SCHEMBL786051 0.89 ALDH1A1 (0.33) ALDH1A1KMT2ASMN1; SMN2
SCHEMBL17789353 0.88 ALDH1A1 (0.33) ALDH1A1KMT2ASMN1; SMN2
SCHEMBL11948908 0.87 ALDH1A1 (0.35) ALDH1A1
SCHEMBL17789378 0.86 ALDH1A1 (0.32) ALDH1A1KMT2ASMN1; SMN2
SCHEMBL26939428 0.85 ALDH1A1 (0.31) ALDH1A1SMN1; SMN2
SCHEMBL110539 0.81 CYP17A1 (0.40) ALDH1A1KMT2ASMN1; SMN2
SCHEMBL683427 0.81 ALDH1A1 (0.34) ALDH1A1KMT2ASMN1; SMN2
SCHEMBL4403803 0.79 TSHR (0.34)
SCHEMBL4399164 0.79 TSHR (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160152755-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed
US-20160152755-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed
US-8101335-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-24 US disclosed