Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 1/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL822780 | 0.87 | ALDH1A1 (0.36) | CYP19A1MEN1ALDH1A1KMT2A | |
| SCHEMBL29281840 | 0.82 | MEN1 (0.30) | MEN1ALDH1A1KMT2A | |
| SCHEMBL10169153 | 0.82 | — | — | |
| SCHEMBL10169164 | 0.82 | MEN1 (0.31) | MEN1ALDH1A1KMT2A | |
| SCHEMBL4857036 | 0.81 | — | — | |
| SCHEMBL6560570 | 0.80 | DPP4 (0.37) | MEN1ALDH1A1KMT2A | |
| SCHEMBL19335366 | 0.80 | CYP17A1 (0.37) | SCN9ACYP17A1CYP19A1 | |
| SCHEMBL10211044 | 0.79 | CYP19A1 (0.34) | CYP17A1CYP19A1MEN1ALDH1A1KMT2A | |
| SCHEMBL4105447 | 0.79 | DPP8 (0.32) | CYP17A1CYP19A1MEN1ALDH1A1KMT2A | |
| SCHEMBL2610380 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |