Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.37 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.37 |
| ▸ | CLK1 | P49759 | 1/20 | 0.36 |
| ▸ | CLK2 | P49760 | 1/20 | 0.36 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.36 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.36 |
| ▸ | DYRK1B | Q9Y463 | 1/20 | 0.36 |
| ▸ | DPP8 | Q6V1X1 | 2/20 | 0.34 |
| ▸ | DPP9 | Q86TI2 | 2/20 | 0.34 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | DPP4 | P27487 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18457340 | 0.85 | CYP17A1 (0.38) | CYP17A1CYP19A1CLK1CLK2DYRK1A | |
| SCHEMBL2607818 | 0.85 | CYP17A1 (0.34) | CYP17A1CYP19A1DPP8DPP9SCN9A | |
| SCHEMBL19718964 | 0.84 | — | — | |
| SCHEMBL20697766 | 0.84 | TSHR (0.40) | CYP17A1CYP19A1SCN9ATSHRNPSR1 | |
| SCHEMBL10173655 | 0.82 | CYP17A1 (0.38) | CYP17A1CYP19A1CLK1CLK2DYRK1A | |
| SCHEMBL11358004 | 0.82 | SCN9A (0.34) | CYP17A1CYP19A1DPP8DPP9SCN9A | |
| SCHEMBL47315 | 0.82 | CYP17A1 (0.32) | CYP17A1CYP19A1SCN9A | |
| SCHEMBL22266838 | 0.82 | CYP17A1 (0.35) | CYP17A1CYP19A1DPP8DPP9SCN9A | |
| SCHEMBL9764361 | 0.81 | CYP19A1 (0.43) | CYP17A1CYP19A1TSHRNPSR1 | |
| SCHEMBL13232360 | 0.81 | CYP19A1 (0.50) | CYP17A1CYP19A1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |