SCHEMBL26312816

SCHEMBL26312816

C=C(C)C(=O)OC12CC3CC(C1)CC(C(=O)OCCC(F)(F)CS(=O)(=O)O)(C3)C2

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.38
RXFP1 Q9HBX9 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312824 0.88 NPSR1 (0.40) NPSR1RXFP1
SCHEMBL20668206 0.87 NPSR1 (0.46) NPSR1RXFP1
SCHEMBL24400982 0.86 NPSR1 (0.38) NPSR1
SCHEMBL25844791 0.86 NPSR1 (0.38) NPSR1
SCHEMBL10169166 0.85 NPSR1 (0.39) NPSR1RXFP1
SCHEMBL20668205 0.85 NPSR1 (0.42) NPSR1RXFP1
SCHEMBL12409643 0.84 NPSR1 (0.43) NPSR1RXFP1
SCHEMBL25844989 0.84 NPSR1 (0.38) NPSR1RXFP1
SCHEMBL27008287 0.84 NPSR1 (0.41) NPSR1RXFP1
SCHEMBL16020889 0.83 NPSR1 (0.39) NPSR1RXFP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed