SCHEMBL10169729

SCHEMBL10169729

C=C(C(=O)ON=C(c1ccccc1)C(F)(F)F)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 3/20 0.42
NPC1 O15118 3/20 0.35
RAB9A P51151 3/20 0.35
PKM P14618 2/20 0.35
TDP1 Q9NUW8 2/20 0.34
ATM Q13315 1/20 0.34
MAPT P10636 3/20 0.33
ALDH1A1 P00352 2/20 0.33
CYP2C19 P33261 2/20 0.33
KMT2A Q03164 1/20 0.33
POLB P06746 1/20 0.33
CYP3A4 P08684 1/20 0.33
PARP1 P09874 1/20 0.33
TSHR P16473 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
PMP22 Q01453 1/20 0.33
HSD17B10 Q99714 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MGLL Q99685 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775651 0.86 ELANE (0.44) CES1NPC1RAB9APKMTDP1
SCHEMBL10172183 0.86 ELANE (0.44) CES1NPC1RAB9APKMTDP1
SCHEMBL12705069 0.86 ELANE (0.44) CES1NPC1RAB9APKMTDP1
SCHEMBL776030 0.78 AKT1 (0.42) CES1NPC1RAB9APKMTDP1
SCHEMBL775653 0.76 ELANE (0.38) CES1TDP1MAPTALDH1A1KMT2A
SCHEMBL12726767 0.74 ELANE (0.41) CES1NPC1RAB9APKMTDP1
SCHEMBL775596 0.72 TDP1 (0.39) RAB9ATDP1MAPTALDH1A1KMT2A
SCHEMBL12705082 0.72 TDP1 (0.39) RAB9ATDP1MAPTALDH1A1KMT2A
SCHEMBL9799689 0.72 L3MBTL1 (0.43) CES1NPC1RAB9APKMTDP1
SCHEMBL12705103 0.72 CES1 (0.39) CES1TDP1ALDH1A1CYP2C19POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-20120034563-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-09 US disclosed
US-20120034563-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-09 US disclosed