SCHEMBL10172183

SCHEMBL10172183

C=C(C)C(=O)ON=C(c1ccccc1)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.44
CES1 P23141 3/20 0.41
ALDH1A1 P00352 3/20 0.37
LMNA P02545 3/20 0.37
TDP1 Q9NUW8 2/20 0.36
ATM Q13315 2/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
MAPK1 P28482 2/20 0.36
MAPT P10636 3/20 0.36
PKM P14618 2/20 0.35
CDK5 Q00535 1/20 0.35
CDK5R1 Q15078 1/20 0.35
CES2 O00748 2/20 0.35
TNF P01375 1/20 0.35
KLF5 Q13887 1/20 0.35
NOD1 Q9Y239 1/20 0.35
ACHE P22303 1/20 0.35
RAB9A P51151 3/20 0.34
NPC1 O15118 2/20 0.34
KMT2A Q03164 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12705069 1.00 ELANE (0.44) ELANECES1ALDH1A1LMNATDP1
SCHEMBL775651 1.00 ELANE (0.44) ELANECES1ALDH1A1LMNATDP1
SCHEMBL12726767 0.87 ELANE (0.41) ELANECES1ALDH1A1LMNATDP1
SCHEMBL10169729 0.86 CES1 (0.42) ELANECES1ALDH1A1LMNATDP1
SCHEMBL775653 0.85 ELANE (0.38) ELANECES1ALDH1A1LMNATDP1
SCHEMBL775927 0.84 NPC1 (0.42) ELANECES1ALDH1A1LMNATDP1
SCHEMBL775642 0.82 ELANE (0.37) ELANECES1ALDH1A1LMNATDP1
SCHEMBL775596 0.81 TDP1 (0.39) ELANEALDH1A1LMNATDP1MAPT
SCHEMBL12705082 0.81 TDP1 (0.39) ELANEALDH1A1LMNATDP1MAPT
SCHEMBL2625686 0.81 PKM (0.39) CES1ALDH1A1TDP1SMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574811-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 US disclosed
US-8574811-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 US disclosed
US-20120052443-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-01 US disclosed
US-20120052443-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-01 US disclosed