SCHEMBL10170831

SCHEMBL10170831

CCC1(OC(C)=O)CC2CC1C1CCCCC21

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
GAA P10253 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9609343 0.97 ALDH1A1 (0.33) ALDH1A1GAAMAPT
SCHEMBL2117636 0.83 ALDH1A1 (0.31) ALDH1A1GAAMAPT
SCHEMBL23382981 0.83 ALDH1A1 (0.32) ALDH1A1GAAMAPT
SCHEMBL10231585 0.82 EPHX2 (0.30)
SCHEMBL13116173 0.82
SCHEMBL26349550 0.82 ALDH1A1 (0.31) ALDH1A1GAAMAPT
SCHEMBL19954391 0.82 ALDH1A1 (0.31) ALDH1A1GAAMAPT
SCHEMBL9608674 0.82 ALDH1A1 (0.31) ALDH1A1GAAMAPT
SCHEMBL4403854 0.81 ALDH1A1 (0.33) ALDH1A1GAAMAPT
SCHEMBL75351 0.80 TSHR (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation Central Glass Company , Limited (JP) 2011-10-06 US disclosed
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation Central Glass Company , Limited (JP) 2011-10-06 US disclosed
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation AFF1, FRG1, AFF2 ALDH1A1 2056/4885GAA 4855/4885MAPT 4303/4885
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method FRG1, AFF2, FBXL19 ALDH1A1 4430/4885GAA 4562/4885MAPT 836/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.