SCHEMBL10175680

SCHEMBL10175680

C=C(C)C(=O)OCCC(=O)OCCC(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.43
TSHR P16473 3/20 0.42
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
MAPT P10636 1/20 0.35
BLM P54132 1/20 0.35
ALDH1A1 P00352 2/20 0.34
ADRA2A P08913 1/20 0.32
ADRA1A P35348 1/20 0.32
DGKA P23743 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL615661 0.89 THRB (0.52) THRBTSHRPOLBAPEX1HTT
SCHEMBL10175672 0.89 THRB (0.42) THRBTSHRPOLBAPEX1HTT
SCHEMBL18467666 0.85 TSHR (0.49) THRBTSHRPOLBAPEX1HTT
SCHEMBL10226382 0.85 THRB (0.44) THRBTSHRPOLBAPEX1HTT
SCHEMBL10189288 0.85 THRB (0.41) THRBTSHRPOLBAPEX1HTT
SCHEMBL2466488 0.84 THRB (0.59) THRBTSHRPOLBAPEX1HTT
SCHEMBL13759970 0.83 THRB (0.38) THRBTSHRPOLBAPEX1HTT
SCHEMBL10175675 0.83 THRB (0.38) THRBTSHRPOLBAPEX1HTT
SCHEMBL8518828 0.83 THRB (0.46) THRBTSHRPOLBAPEX1HTT
SCHEMBL2463282 0.80 TSHR (0.63) THRBTSHRPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8642244-B2 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-04 US disclosed
US-8501387-B2 2013-08-06 US disclosed
US-20120077125-A1 RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2012-03-29 US disclosed