Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | SLC13A3 | Q8WWT9 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22662269 | 0.90 | THRB (0.39) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL15449222 | 0.88 | THRB (0.40) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL615661 | 0.87 | THRB (0.52) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL10175680 | 0.85 | THRB (0.43) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2628305 | 0.83 | THRB (0.55) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2611139 | 0.83 | THRB (0.36) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL800122 | 0.82 | TSHR (0.41) | THRBTSHRALDH1A1HTT | |
| SCHEMBL2608052 | 0.82 | TSHR (0.41) | THRBTSHRALDH1A1POLBAPEX1 | |
| Ethylene SCHEMBL3171143 | 0.81 | THRB (0.53) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL22662309 | 0.81 | TSHR (0.42) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8530598-B2 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20120116038-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING RESIN | TAKESHITA MASARU (JP) | 2012-05-10 | — | — | US | disclosed |