⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9239574 | 0.81 | CYP4F2 (0.38) | — | |
| SCHEMBL2607992 | 0.81 | HTT (0.32) | — | |
| SCHEMBL12730170 | 0.81 | ALDH1A1 (0.41) | — | |
| SCHEMBL6899684 | 0.80 | MMP8 (0.39) | — | |
| SCHEMBL13210011 | 0.78 | HTT (0.31) | — | |
| SCHEMBL15396640 | 0.78 | — | — | |
| SCHEMBL2607993 | 0.78 | MMP8 (0.32) | — | |
| SCHEMBL13153230 | 0.78 | — | — | |
| SCHEMBL14649900 | 0.77 | — | — | |
| SCHEMBL16684192 | 0.76 | CA1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642244-B2 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-02-04 | — | — | US | disclosed |
| US-8501387-B2 | — | — | 2013-08-06 | — | — | US | disclosed |
| US-20120077125-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-29 | — | — | US | disclosed |