⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17644014 | 0.81 | — | — | |
| SCHEMBL18232560 | 0.76 | ALDH1A1 (0.30) | — | |
| SCHEMBL4229164 | 0.75 | — | — | |
| SCHEMBL14668867 | 0.73 | THRB (0.36) | — | |
| SCHEMBL15942730 | 0.73 | — | — | |
| SCHEMBL16328942 | 0.72 | — | — | |
| SCHEMBL16247736 | 0.69 | HTT (0.31) | — | |
| SCHEMBL12009841 | 0.68 | — | — | |
| SCHEMBL19493546 | 0.68 | — | — | |
| SCHEMBL17480195 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802349-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20120077131-A1 | METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-8043791-B2 | Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition | FUJIFILM CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20100216072-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION AND RESIN FOR USE IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-08-26 | — | — | US | disclosed |