SCHEMBL10178591

SCHEMBL10178591

CCC(C)c1ccc(COc2c(-c3ccccc3)cccc2-c2ccccc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
BCHE P06276 3/20 0.40
RXRA P19793 1/20 0.40
RXRB P28702 1/20 0.40
RXRG P48443 1/20 0.40
ALDH1A1 P00352 1/20 0.39
TSHR P16473 1/20 0.39
GSTP1 P09211 1/20 0.38
PTGER1 P34995 1/20 0.37
PTGER4 P35408 1/20 0.37
PTGER3 P43115 1/20 0.37
PTGER2 P43116 1/20 0.37
HSP90AA1 P07900 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
FFAR1 O14842 1/20 0.36
SLC7A5 Q01650 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10179168 0.86 BCHE (0.40) BCHEPTGER1PTGER4PTGER3PTGER2
SCHEMBL10178454 0.86 RXRA (0.56) RAB9ARXRARXRBRXRGPTGER1
SCHEMBL14118711 0.82 ALDH1A1 (0.48) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL14118337 0.79 BCHE (0.55) NPC1RAB9ABCHEALDH1A1TSHR
SCHEMBL6721888 0.79 BCHE (0.55) NPC1RAB9ABCHEALDH1A1TSHR
SCHEMBL14866957 0.79 BCHE (0.52) NPC1RAB9ABCHEGSTP1FFAR1
SCHEMBL6722051 0.79 BCHE (0.56) NPC1RAB9ABCHERXRARXRB
SCHEMBL10178497 0.78 KDM4E (0.51) RAB9ARXRARXRBRXRGALDH1A1
SCHEMBL14118430 0.76 ALDH1A1 (0.45) NPC1RAB9AALDH1A1TSHRFFAR1
SCHEMBL682221 0.76 SLC7A5 (0.41) NPC1RAB9AALDH1A1TSHRSLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed