SCHEMBL10178641

SCHEMBL10178641

CCC(C)c1ccc(CC(=O)c2ccccc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLAU P00749 1/20 0.51
MAPT P10636 3/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
ALDH1A1 P00352 4/20 0.46
TSHR P16473 2/20 0.46
SRD5A2 P31213 2/20 0.46
NPC1 O15118 5/20 0.44
RAB9A P51151 5/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
TP53 P04637 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
SMO Q99835 1/20 0.43
LMNA P02545 2/20 0.42
KDM4E B2RXH2 1/20 0.42
APAF1 O14727 1/20 0.42
MITF O75030 1/20 0.42
HTT P42858 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178522 0.94 SRD5A2 (0.56) PLAUMAPTL3MBTL1ALDH1A1TSHR
SCHEMBL10178688 0.91 SRD5A2 (0.56) MAPTL3MBTL1ALDH1A1TSHRSRD5A2
SCHEMBL10178689 0.85 TSHR (0.44) PLAUMAPTL3MBTL1ALDH1A1TSHR
SCHEMBL3917034 0.85 NPC1 (0.56) PLAUMAPTL3MBTL1ALDH1A1SRD5A2
SCHEMBL10178695 0.84 RAB9A (0.51) MAPTL3MBTL1ALDH1A1TSHRNPC1
SCHEMBL10001830 0.83 TSHR (0.49) L3MBTL1ALDH1A1TSHRNPC1RAB9A
SCHEMBL10178655 0.83 HDAC4 (0.48) PLAUMAPTL3MBTL1ALDH1A1SRD5A2
SCHEMBL13144211 0.82 STS (0.47) MAPTL3MBTL1ALDH1A1TSHRSRD5A2
SCHEMBL10174246 0.81 ALDH1A1 (0.57) L3MBTL1ALDH1A1TSHRNPC1RAB9A
Isobutane SCHEMBL1801676 0.81 MAPT (0.63) PLAUMAPTL3MBTL1ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed