SCHEMBL10179749

SCHEMBL10179749

CCC(C)c1ccc(CSc2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 1/20 0.53
ELANE P08246 1/20 0.46
KDM4E B2RXH2 4/20 0.44
MAPT P10636 3/20 0.44
NPSR1 Q6W5P4 2/20 0.44
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
MAOA P21397 2/20 0.42
MAOB P27338 2/20 0.42
PPARG P37231 1/20 0.41
PPARA Q07869 1/20 0.41
HPGD P15428 3/20 0.40
ALDH1A1 P00352 3/20 0.39
LMNA P02545 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
LTA4H P09960 1/20 0.38
TSHR P16473 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17037257 0.84 SLC6A4 (0.57) SLC6A4ELANEKDM4EMAPTNPSR1
SCHEMBL10178571 0.82 ALDH1A1 (0.40) SLC6A4NPSR1HPGDALDH1A1NPC1
SCHEMBL10178662 0.82 SLC6A4 (0.49) SLC6A4ELANEKDM4EMAPTNPSR1
SCHEMBL156793 0.79 TP53 (0.56) SLC6A4ELANEKDM4EMAPTNPSR1
SCHEMBL10055053 0.79 ALDH1A1 (0.57) SLC6A4ELANEKDM4EMAPTMEN1
SCHEMBL13328498 0.79 LMNA (0.56) MAPTMEN1KMT2AHPGDALDH1A1
SCHEMBL17694311 0.78 HPGD (0.48) SLC6A4MAPTMEN1KMT2AMAOA
SCHEMBL13750284 0.77 HSD17B10 (0.56) MAPTMEN1KMT2AHPGDALDH1A1
SCHEMBL29281831 0.77 SLC6A4 (0.62) SLC6A4MEN1KMT2AMAOAMAOB
SCHEMBL10178552 0.76 ALDH1A1 (0.43) NPSR1HPGDALDH1A1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed