SCHEMBL10179844

SCHEMBL10179844

CCC(C)CSCc1cccc(C(C)CC)c1

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
ALDH1A1 P00352 2/20 0.38
USP2 O75604 1/20 0.38
GAA P10253 1/20 0.38
PKM P14618 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
TNF P01375 1/20 0.36
NOD1 Q9Y239 1/20 0.36
NR3C1 P04150 1/20 0.34
ACHE P22303 1/20 0.31
CYP1A2 P05177 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178617 0.85 HDAC4 (0.46) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL10179892 0.84 HDAC4 (0.45) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL25636408 0.82 ACHE (0.36) ALDH1A1HPGDNPC1RAB9ATNF
SCHEMBL23260283 0.82 ACHE (0.36) ALDH1A1HPGDNPC1RAB9ATNF
SCHEMBL10178512 0.80 HDAC4 (0.47) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL9906423 0.78 ACE (0.43) CYP1A2
SCHEMBL24015316 0.76 HDAC4 (0.53) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL10178662 0.75 SLC6A4 (0.49) HDAC4HDAC2HDAC8ALDH1A1USP2
SCHEMBL12417818 0.73 HDAC4 (0.37) HDAC4HDAC2HDAC8ALDH1A1HPGD
SCHEMBL1006801 0.73 HDAC4 (0.62) HDAC4HDAC2HDAC8ALDH1A1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed