SCHEMBL10179892

SCHEMBL10179892

CCC(C)c1cccc(CSCc2ccccc2)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.45
HDAC2 Q92769 1/20 0.45
HDAC8 Q9BY41 1/20 0.45
NPC1 O15118 1/20 0.41
TNF P01375 1/20 0.41
RAB9A P51151 1/20 0.41
NOD1 Q9Y239 1/20 0.41
USP2 O75604 1/20 0.40
ALDH1A1 P00352 1/20 0.40
GAA P10253 1/20 0.40
PKM P14618 1/20 0.40
HPGD P15428 1/20 0.40
ALOX15 P16050 1/20 0.40
HSD17B10 Q99714 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.38
SLC6A4 P31645 2/20 0.37
TRPA1 O75762 1/20 0.37
TAAR1 Q96RJ0 4/20 0.36
SLC6A2 P23975 2/20 0.36
MAOA P21397 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178617 0.88 HDAC4 (0.46) HDAC4HDAC2HDAC8NPC1TNF
SCHEMBL10178571 0.84 ALDH1A1 (0.40) NPC1RAB9AUSP2ALDH1A1GAA
SCHEMBL10178662 0.84 SLC6A4 (0.49) HDAC4HDAC2HDAC8USP2ALDH1A1
SCHEMBL10179844 0.84 HDAC4 (0.43) HDAC4HDAC2HDAC8NPC1TNF
SCHEMBL10178512 0.83 HDAC4 (0.47) HDAC4HDAC2HDAC8NPC1TNF
SCHEMBL10179200 0.79 SLC6A4 (0.48) HDAC4HDAC2HDAC8USP2ALDH1A1
SCHEMBL24015316 0.78 HDAC4 (0.53) HDAC4HDAC2HDAC8NPC1RAB9A
SCHEMBL10178628 0.77 TSHR (0.50) HDAC4HDAC2HDAC8
SCHEMBL1006801 0.75 HDAC4 (0.62) HDAC4HDAC2HDAC8USP2ALDH1A1
SCHEMBL9963705 0.75 HDAC4 (0.54) HDAC4HDAC2HDAC8NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed