Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10180550 | 0.93 | TSHR (0.32) | MEN1KMT2ATHRBTSHR | |
| SCHEMBL10179724 | 0.88 | MEN1 (0.33) | MEN1KMT2ATHRBTSHRALDH1A1 | |
| SCHEMBL550030 | 0.86 | MEN1 (0.34) | MEN1KMT2ATHRBTSHRALDH1A1 | |
| SCHEMBL10233144 | 0.84 | MEN1 (0.33) | MEN1KMT2AALDH1A1MAPTATM | |
| SCHEMBL10181507 | 0.79 | — | — | |
| SCHEMBL10233092 | 0.74 | MEN1 (0.39) | MEN1KMT2ATHRBTSHRALDH1A1 | |
| SCHEMBL549925 | 0.73 | ALDH1A1 (0.36) | MEN1KMT2ATHRBTSHRALDH1A1 | |
| SCHEMBL20920211 | 0.73 | ALDH1A1 (0.36) | MEN1KMT2ATHRBTSHRALDH1A1 | |
| SCHEMBL5001405 | 0.72 | MEN1 (0.56) | MEN1KMT2ATHRBTSHRALDH1A1 | |
| SCHEMBL20920212 | 0.70 | ALDH1A1 (0.37) | MEN1KMT2ATHRBTSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802349-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8802349-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20120015301-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |