SCHEMBL1022671

SCHEMBL1022671

C=COC(=O)OC(=O)OC=C

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
TSHR P16473 2/20 0.37
FGFR4 P22455 1/20 0.37
LMNA P02545 1/20 0.32
SOAT1 P35610 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1802495 0.91 ALDH1A1 (0.32) ALDH1A1TSHRFGFR4
Cyclohexane SCHEMBL1801941 0.91 ALDH1A1 (0.32) ALDH1A1TSHRFGFR4
Cyclopropane SCHEMBL1799907 0.91 ALDH1A1 (0.32) ALDH1A1TSHRFGFR4
SCHEMBL35719 0.86
SCHEMBL7935518 0.85
1,3-Propanediol SCHEMBL4394586 0.84 TSHR (0.33) TSHR
Ethylene SCHEMBL167404 0.83 LMNA (0.33) ALDH1A1TSHRFGFR4LMNA
Bicarbonate SCHEMBL25229752 0.80 LMNA (0.39) ALDH1A1TSHRFGFR4LMNA
SCHEMBL11765804 0.79 ALDH1A1 (0.39) ALDH1A1TSHRSOAT1
SCHEMBL8082775 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3481936-A1 DISHWASHER AGENT CONTAINING SACCHARIC ACID AND AMINO CARBOXYLIC ACID Henkel AG & Co. KGaA (DE) 2019-05-15 EP disclosed
EP-3472291-A1 CONCENTRATED ISOTROPIC LIQUID DETERGENTS CONTAINING POLYMERS Henkel AG & Co. KGaA (DE) 2019-04-24 EP disclosed
EP-3472285-A1 C8-10-ALKYLAMIDOALKYL BEATAINE AS ANTI-WRINKLE AGENT Henkel AG & Co. KGaA (DE) 2019-04-24 EP disclosed
EP-3472290-A1 CONCENTRATED ISOTROPIC LIQUID DETERGENTS CONTAINING POLYMERS Henkel AG & Co. KGaA (DE) 2019-04-24 EP disclosed
EP-3472293-A1 CONCENTRATED LIQUID DETERGENT HAVING A CONSTANT PH VALUE Henkel AG & Co. KGaA (DE) 2019-04-24 EP disclosed
EP-3472289-A1 CONCENTRATED LIQUID DETERGENTS CONTAINING POLYMERS Henkel AG & Co. KGaA (DE) 2019-04-24 EP disclosed
EP-3472312-A1 BACILLUS GIBSONII PROTEASE AND VARIANTS THEREOF Henkel AG & Co. KGaA (DE) 2019-04-24 EP disclosed
EP-3440176-A1 DISHWASHING DETERGENT CONTAINING UREA DERIVATIVES Henkel AG & Co. KGaA (DE) 2019-02-13 EP disclosed
EP-3436559-A1 DISHWASHING DETERGENT WITH IMPROVED RINSING PERFORMANCE Henkel AG & Co. KGaA (DE) 2019-02-06 EP disclosed
EP-3436560-A1 TEXTILE TREATMENT AGENT WITHOUT CATIONIC SURFACTANTS Henkel AG & Co. KGaA (DE) 2019-02-06 EP disclosed
US-7009031-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2006-03-07 US disclosed
US-20050154073-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2005-07-14 US disclosed
EP-1524289-A1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-04-20 EP disclosed
US-6872333-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) 2005-03-29 US disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed
US-20040158031-A1 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-08-12 US disclosed
EP-1398317-A1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-03-17 EP disclosed
US-20040024165-A1 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-02-05 US disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed