SCHEMBL10227044

SCHEMBL10227044

N#Cc1ccc(/C(=N\OS)c2nc3ccccc3s2)cc1

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.52
▸ MEN1 O00255 9/20 0.52
▸ KMT2A Q03164 9/20 0.52
▸ SMN1; SMN2 Q16637 3/20 0.52
▸ PDE10A Q9Y233 1/20 0.46
▸ RECQL P46063 2/20 0.45
▸ THRB P10828 1/20 0.45
▸ RAB9A P51151 5/20 0.44
▸ NPC1 O15118 4/20 0.44
▸ LMNA P02545 4/20 0.44
▸ HTT P42858 3/20 0.44
▸ ALDH1A1 P00352 6/20 0.44
▸ TSHR P16473 1/20 0.43
▸ CRHBP P24387 1/20 0.43
▸ CRHR2 Q13324 1/20 0.43
▸ KDM4E B2RXH2 3/20 0.40
▸ POLB P06746 1/20 0.40
▸ GALK1 P51570 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6124086 0.86 MAPT (0.51) MAPTMEN1KMT2ASMN1; SMN2PDE10A
SCHEMBL10227050 0.81 ALDH1A1 (0.44) MAPTMEN1KMT2ASMN1; SMN2PDE10A
SCHEMBL6127720 0.77 RECQL (0.55) MAPTMEN1KMT2ASMN1; SMN2RECQL
SCHEMBL6127682 0.72 ALDH1A1 (0.53) MAPTMEN1KMT2ASMN1; SMN2RECQL
SCHEMBL6124088 0.71 ALDH1A1 (0.49) MAPTMEN1KMT2ASMN1; SMN2RECQL
SCHEMBL6124090 0.70 MAPT (0.45) MAPTMEN1KMT2ASMN1; SMN2RAB9A
SCHEMBL2886067 0.68 MEN1 (0.74) MAPTMEN1KMT2ASMN1; SMN2RECQL
SCHEMBL2886066 0.68 MEN1 (0.74) MAPTMEN1KMT2ASMN1; SMN2RECQL
SCHEMBL6124085 0.67 SCD (0.49) MAPTMEN1KMT2ASMN1; SMN2RAB9A
SCHEMBL13377974 0.67 MEN1 (0.51) MAPTMEN1KMT2ASMN1; SMN2RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120107563-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-05-03 — — US disclosed
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