SCHEMBL10227464

SCHEMBL10227464

O=C1OCC2C1C1CC[C@@H]2C1

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10952293 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL10725807 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL14354860 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL16229305 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL45974 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL14231430 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL10281653 1.00 ALDH1A1 (0.30) ALDH1A1MEN1KMT2A
SCHEMBL12908130 0.92
SCHEMBL13444675 0.86 KDM4E (0.30)
SCHEMBL10035496 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220155688-A1 ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-8088550-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2012-01-03 US disclosed
US-20090035692-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD FUJIFILM CORPORATION (JP) 2009-02-05 US disclosed