Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10952293 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL10725807 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL14354860 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL16229305 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL10227464 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL14231430 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL10281653 | 1.00 | ALDH1A1 (0.30) | ALDH1A1MEN1KMT2A | |
| SCHEMBL12908130 | 0.92 | — | — | |
| SCHEMBL13444675 | 0.86 | KDM4E (0.30) | — | |
| SCHEMBL10035496 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2746 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250282903-A1 | COPOLYMER OF HYDROXYSTYRENE-BASED MONOMER AND (METH)ACRYLIC ACID ESTER-BASED MONOMER, AND PRODUCTION METHOD THEREOF | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2025-09-11 | — | — | US | disclosed |
| US-20250230287-A1 | METHOD FOR PRODUCING POLYMER SOLUTION | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2025-07-17 | — | — | US | disclosed |
| CN-115210208-B | High-purity 4-hydroxystyrene solution, process for producing the same, and process for producing 4-hydroxystyrene polymer | 丸善石油化学株式会社 | 2025-05-23 | — | — | CN | disclosed |
| EP-4512850-A1 | METHOD FOR PRODUCING POLYMER SOLUTION | Maruzen Petrochemical Co., Ltd. (JP) | 2025-02-26 | — | — | EP | disclosed |
| CN-118984850-A | Method for producing polymer solution | 丸善石油化学株式会社 | 2024-11-19 | — | — | CN | disclosed |
| US-20240241444-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-6992197-B2 | Lactone compound | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2006-01-31 | — | — | US | disclosed |
| US-20050131184-A1 | Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050096447-A1 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20050032887-A1 | useful as a monomer for forming resins for paints, adhesives, binders, inks, resists, etc., and an alcohol compound having a lactone moiety useful as a material therefor | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2005-02-10 | — | — | US | disclosed |
| US-20030083529-A1 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-0150015-B1 | NORBORNANE AND NORBORNENE CARBOXYLIC ACID AMIDES AND PROCESS FOR THEIR PREPARATION | BAYER AG (DE) | 1987-06-16 | — | — | EP | disclosed |
| US-4647585-A | Bicycloheptane substituted ethers | E. R. SQUIBB & SONS, INC. (US) | 1987-03-03 | — | — | US | disclosed |
| US-4622339-A | ANTICOAGULANTS, ANTIISCHEMIC, ANTIATHEROSCLEROTICS | BAYER AKTIENGESELLSCHAFT (DE) | 1986-11-11 | — | — | US | disclosed |
| EP-0150015-A2 | Norbornane and norbornene carboxylic acid amides and process for their preparation | BAYER AG (DE) | 1985-07-31 | — | — | EP | disclosed |