Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL3843414 | 1.00 | APEX1 (0.38) | APEX1LMNAHPGDPKMSMN1; SMN2 | |
| Acrylic Acid SCHEMBL7174523 | 1.00 | APEX1 (0.38) | APEX1LMNAHPGDPKMSMN1; SMN2 | |
| Acrylic Acid SCHEMBL28210794 | 0.90 | ALDH1A1 (0.41) | APEX1LMNAHPGDGAAALDH1A1 | |
| SCHEMBL7177872 | 0.81 | APEX1 (0.33) | APEX1GAAALDH1A1 | |
| Methacrylic Acid SCHEMBL1914676 | 0.81 | APEX1 (0.37) | APEX1HPGDPKMSMN1; SMN2GAA | |
| Methacrylic Acid SCHEMBL4450991 | 0.81 | APEX1 (0.37) | APEX1HPGDPKMSMN1; SMN2GAA | |
| Methacrylic Acid SCHEMBL3635510 | 0.81 | APEX1 (0.37) | APEX1HPGDPKMSMN1; SMN2GAA | |
| Acrylic Acid SCHEMBL4887834 | 0.80 | LMNA (0.37) | APEX1LMNAHPGDSMN1; SMN2GAA | |
| Acrylic Acid SCHEMBL2396208 | 0.79 | LMNA (0.43) | APEX1LMNA | |
| Acrylic Acid SCHEMBL29353386 | 0.79 | LMNA (0.43) | APEX1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102786838-B | Anti-etching composition and application thereof | ETERNAL MATERIALS CO.,LTD. (CN) | 2015-09-16 | — | — | CN | claimed |
| CN-104418815-A | Preparation method of tri(2-ethoxy) isocyanurate acrylate mixture | ANQING PHICHEM POLYMER MATERIAL CO LTD | 2015-03-18 | — | — | CN | claimed |
| CN-110573964-A | Negative photosensitive resin composition and cured film | 东丽株式会社 | 2019-12-13 | — | — | CN | disclosed |
| CN-102786838-B | Anti-etching composition and application thereof | ETERNAL MATERIALS CO.,LTD. (CN) | 2015-09-16 | — | — | CN | disclosed |
| CN-104418815-A | Preparation method of tri(2-ethoxy) isocyanurate acrylate mixture | ANQING PHICHEM POLYMER MATERIAL CO LTD | 2015-03-18 | — | — | CN | disclosed |
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| CN-101840014-A | Polarization diffraction element | JSR CORP | 2010-09-22 | — | — | CN | disclosed |
| CN-101750652-A | Polarization diffraction element and process for manufacturing the same | JSR CORP | 2010-06-23 | — | — | CN | disclosed |
| US-20040254258-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1378535-A1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |