⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14613975 | 1.00 | — | — | |
| SCHEMBL12465236 | 0.90 | — | — | |
| SCHEMBL21168553 | 0.88 | — | — | |
| SCHEMBL15219416 | 0.87 | — | — | |
| SCHEMBL14460005 | 0.83 | — | — | |
| SCHEMBL108134 | 0.76 | — | — | |
| SCHEMBL16687971 | 0.76 | — | — | |
| SCHEMBL17987836 | 0.75 | — | — | |
| SCHEMBL10164053 | 0.74 | — | — | |
| SCHEMBL15942905 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220121123-A1 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-04-21 | — | — | US | disclosed |
| US-10996378-B2 | Antireflective film, method of producing antireflective film, and eyeglass type display | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-04 | — | — | US | disclosed |
| US-10678132-B2 | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin | FUJIFILM CORPORATION (JP) | 2020-06-09 | — | — | US | disclosed |
| US-10578968-B2 | Pattern forming method, resist pattern, and process for producing electronic device | FUJIFILM CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| US-20190196066-A1 | ANTIREFLECTIVE FILM, METHOD OF PRODUCING ANTIREFLECTIVE FILM, AND EYEGLASS TYPE DISPLAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-10175578-B2 | Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2019-01-08 | — | — | US | disclosed |
| US-9709891-B2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20170199461-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170199460-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170176862-A1 | PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| EP-1736485-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2013-07-31 | — | — | EP | disclosed |
| US-20120116038-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING RESIN | TAKESHITA MASARU (JP) | 2012-05-10 | — | — | US | disclosed |
| US-7923199-B2 | Using a sulfonium acid generator that forms a fluorine-substituted sulfonic acid compound; improved in the exposure latitude, pitch dependency and line edge roughness and enhanced in the sensitivity and resolution at the exposure with EUV light | FUJIFILM CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-7807328-B2 | base resin comprises homo-/copolyenes having alkali soluble group, exhibits changed alkali solubility under action of acid, acid generator, and tertiary alkanolamines; for patterning semiconductor integrated circuit via lithography; improved resolution | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-05 | — | — | US | disclosed |
| EP-1811339-A1 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |