Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | SLC29A1 | Q99808 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL3847755 | 1.00 | TSHR (0.37) | TSHRLMNASLC29A1GAA | |
| Acrylic Acid SCHEMBL7170302 | 1.00 | TSHR (0.37) | TSHRLMNASLC29A1GAA | |
| Methacrylic Acid SCHEMBL7174988 | 0.81 | HTT (0.34) | SLC29A1 | |
| Acrylic Acid SCHEMBL4891585 | 0.81 | LMNA (0.36) | TSHRLMNAGAA | |
| SCHEMBL3786507 | 0.76 | TSHR (0.50) | TSHR | |
| SCHEMBL7174074 | 0.75 | HTT (0.33) | LMNASLC29A1 | |
| SCHEMBL15573771 | 0.73 | THRB (0.34) | TSHR | |
| SCHEMBL1264570 | 0.72 | TSHR (0.60) | TSHRSLC29A1 | |
| SCHEMBL10717420 | 0.71 | SLC29A1 (0.38) | SLC29A1 | |
| SCHEMBL600149 | 0.70 | SLC29A1 (0.48) | TSHRSLC29A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| EP-1319966-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-05-26 | — | — | EP | disclosed |
| EP-1378535-B1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-11-11 | — | — | EP | disclosed |
| EP-1524289-B1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-2072560-A2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2009-06-24 | — | — | EP | disclosed |
| US-20090156781-A1 | Manufacturing Method and Apparatus of Optical Material | SEIKO EPSON CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090018308-A1 | Curable Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-01-15 | — | — | US | disclosed |
| EP-1099721-B1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-01-12 | — | — | EP | disclosed |
| US-20040254258-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| EP-1378535-A1 | POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |