Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21066958 | 0.82 | SHBG (0.36) | CYP1A2 | |
| SCHEMBL21066972 | 0.79 | SHBG (0.32) | CYP1A2 | |
| SCHEMBL5400758 | 0.78 | CYP1A2 (0.32) | CYP1A2 | |
| SCHEMBL9609262 | 0.76 | LMNA (0.36) | MEN1ALDH1A1LMNAALOX12KMT2A | |
| SCHEMBL15279355 | 0.76 | — | — | |
| SCHEMBL12332561 | 0.76 | CYP1A2 (0.33) | TSHRCYP1A2 | |
| SCHEMBL12812741 | 0.76 | CYP1A2 (0.33) | TSHRCYP1A2 | |
| SCHEMBL12811979 | 0.75 | SSTR4 (0.32) | MEN1KMT2ANPSR1CHRM2CHRM4 | |
| SCHEMBL14839293 | 0.75 | SSTR4 (0.34) | SMN1; SMN2CHRM2CHRM4CHRM1CHRM3 | |
| SCHEMBL9609264 | 0.74 | LMNA (0.37) | LMNASMN1; SMN2CHRM2CHRM4CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2450746-A1 | Positive resist composition and pattern forming method using the composition | Fujifilm Corporation (JP) | 2012-05-09 | — | — | EP | disclosed |