Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | S1PR3 | Q99500 | 3/20 | 0.41 |
| ▸ | S1PR1 | P21453 | 2/20 | 0.41 |
| ▸ | ADH1B | P00325 | 1/20 | 0.39 |
| ▸ | ADH1C | P00326 | 1/20 | 0.39 |
| ▸ | ADH1A | P07327 | 1/20 | 0.39 |
| ▸ | PHGDH | O43175 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10248089 | 0.98 | TSHR (0.46) | TSHRS1PR3S1PR1ADH1BADH1C | |
| SCHEMBL19652194 | 0.82 | TSHR (0.43) | TSHRS1PR3S1PR1GAA | |
| SCHEMBL2278722 | 0.82 | SLC6A2 (0.54) | — | |
| SCHEMBL17281560 | 0.80 | TSHR (0.44) | TSHRS1PR3S1PR1ADH1BADH1C | |
| SCHEMBL12304280 | 0.79 | ADH1C (0.42) | TSHRADH1BADH1CADH1APHGDH | |
| SCHEMBL19702055 | 0.79 | PIK3CD (0.47) | S1PR3S1PR1 | |
| SCHEMBL27689192 | 0.79 | TSHR (0.42) | TSHRS1PR3S1PR1ADH1BADH1C | |
| SCHEMBL17774457 | 0.77 | ADH1B (0.41) | TSHRADH1BADH1CADH1A | |
| SCHEMBL12308324 | 0.77 | ADH1C (0.45) | TSHRADH1BADH1CADH1APHGDH | |
| SCHEMBL19652116 | 0.77 | KDM4E (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8647812-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20130011619-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20120076996-A1 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |