Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CTSS | P25774 | 1/20 | 0.33 |
| ▸ | CTSK | P43235 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.31 |
| ▸ | NOS1 | P29475 | 2/20 | 0.31 |
| ▸ | NOS3 | P29474 | 1/20 | 0.31 |
| ▸ | NOS2 | P35228 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.31 |
| ▸ | APLNR | P35414 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22810787 | 1.00 | CA1 (0.35) | CA1CA2CA7CTSSCTSK | |
| SCHEMBL12465045 | 0.87 | DGAT1 (0.34) | CA1CA2CA7CTSSCTSK | |
| SCHEMBL24439165 | 0.83 | CA1 (0.33) | CA1CA2CA7CTSSCTSK | |
| SCHEMBL23395735 | 0.83 | — | — | |
| SCHEMBL19142656 | 0.83 | — | — | |
| SCHEMBL18467688 | 0.83 | — | — | |
| SCHEMBL13360961 | 0.82 | ALDH1A1 (0.30) | — | |
| SCHEMBL26689103 | 0.82 | CA1 (0.33) | CA1CA2CA7 | |
| SCHEMBL19901528 | 0.80 | — | — | |
| SCHEMBL26040962 | 0.80 | CYP3A4 (0.30) | CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230384671-A1 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| EP-3677435-B1 | PRINTING PLATE PRECURSOR AND PRINTING PLATE PRECURSOR LAMINATE | FUJIFILM CORP (JP) | 2023-09-06 | — | — | EP | disclosed |
| WO-2023140386-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| US-20230161247-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161247-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20210372895-A1 | HYDROPHILIC SUBSTRATE AND METHOD FOR PREPARING HYDROPHILIC SUBSTRATE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2021-12-02 | — | — | US | disclosed |
| US-10919331-B2 | Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, and lithographic printing method | FUJIFILM CORPORATION (JP) | 2021-02-16 | — | — | US | disclosed |
| WO-2021024925-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD FOR PATTERNED RESIST FILM, AND PRODUCTION METHOD FOR COMPOUND, PHOTO-ACID GENERATOR, AND N–ORGANOSULFONYLOXY COMPOUND | 東京応化工業株式会社 | 2021-02-11 | — | — | WO | disclosed |
| US-20210018836-A1 | PHOTORESIST COMPOSITION FOR THICK FILM AND METHOD OF FORMING THICK FILM PHOTORESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-01-21 | — | — | US | disclosed |
| US-20200353768-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, LITHOGRAPHIC PRINTING PLATE PRECURSOR LAMINATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2020-11-12 | — | — | US | disclosed |
| EP-1925979-A1 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM Corporation (JP) | 2008-05-28 | — | — | EP | disclosed |
| US-20080085464-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUNDS FOR USE IN THE POSITIVE PHOTOSENSITIVE COMPOSITION, MANUFACTURING METHOD OF THE POLYMER COMPOUNDS, COMPOUNDS FOR USE IN THE MANUFACTURE OF THE POLYMER COMPOUNDS, AND PATTERN-FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| EP-1906241-A1 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| EP-1835341-A1 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| EP-1811338-A2 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |
| US-20070141512-A1 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| EP-1764652-A2 | Positive resist composition and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |