Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | EPHX2 | P34913 | 8/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | P2RX7 | Q99572 | 3/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2634441 | 0.85 | ALDH1A1 (0.53) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL879453 | 0.81 | ALDH1A1 (0.45) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL16301150 | 0.79 | ALDH1A1 (0.50) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL6384681 | 0.79 | ALDH1A1 (0.61) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL10248822 | 0.79 | ALDH1A1 (0.43) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL10284324 | 0.78 | ALDH1A1 (0.51) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL10248355 | 0.78 | ALDH1A1 (0.51) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL10248081 | 0.76 | ALDH1A1 (0.58) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL20672013 | 0.75 | EPHX2 (0.44) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 | |
| SCHEMBL12994521 | 0.74 | MAPT (0.49) | ALDH1A1TSHREPHX2HSD17B10L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8647812-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20130011619-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-01-10 | — | — | US | disclosed |
| US-20120076996-A1 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120076996-A1 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |