Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A known ✓ | P28223 | 1/20 | 0.33 |
| ▸ | BACE1 | P56817 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.35 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | APEX1 | P27695 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | DDB1 | Q16531 | 2/20 | 0.34 |
| ▸ | CRBN | Q96SW2 | 2/20 | 0.34 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.33 |
| ▸ | CACNA1F | O60840 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22438572 | 0.90 | BACE1 (0.41) | BACE1MMP2MMP9POLBCYP19A1 | |
| SCHEMBL9479023 | 0.73 | BACE1 (0.41) | BACE1MMP2MMP9POLBCYP19A1 | |
| SCHEMBL10587179 | 0.73 | KMT2A (0.38) | CYP19A1MEN1KMT2AALDH1A1DDB1 | |
| SCHEMBL2399034 | 0.70 | MAPT (0.43) | MEN1KMT2AMAPTKCNH2 | |
| SCHEMBL2399041 | 0.70 | MAPT (0.43) | MEN1KMT2AMAPTKCNH2 | |
| SCHEMBL1025165 | 0.70 | BACE1 (0.38) | BACE1MMP2MMP9POLBCYP19A1 | |
| SCHEMBL1568276 | 0.68 | CYP19A1 (0.68) | BACE1MMP2MMP9POLBCYP19A1 | |
| SCHEMBL10970570 | 0.67 | BACE1 (0.43) | BACE1MMP2MMP9POLBCYP19A1 | |
| Phenytoin SCHEMBL28854516 | 0.67 | CYP2C9 (0.76) | MMP2MMP9POLBALDH1A1CACNA1F | |
| SCHEMBL7639596 | 0.67 | CYP19A1 (0.37) | POLBCYP19A1GPR55MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108693713-A | Resist lower layer membrane material, pattern forming method and resist lower membrane forming method | 信越化学工业株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108693705-A | Resist lower layer membrane material, pattern forming method and resist lower membrane forming method | 信越化学工业株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108137478-A | Compound, resin, resist composition or radiation-sensitive composition, method for forming resist pattern, method for producing amorphous film, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for forming circuit pattern, and purification method | 三菱瓦斯化学株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-107949808-A | Lower layer film for lithography forms material, lower layer film for lithography is formed with composition, lower layer film for lithography and its manufacture method, pattern formation method, resin and purification process | 三菱瓦斯化学株式会社 | 2018-04-20 | — | — | CN | disclosed |
| CN-107407884-A | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for forming resist pattern, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-107250089-A | Compound, resin, lower layer film for lithography formation material, lower layer film for lithography form the purification process with composition, lower layer film for lithography, corrosion-resisting pattern forming method, circuit pattern forming method and compound or resin | 三菱瓦斯化学株式会社 | 2017-10-13 | — | — | CN | disclosed |
| CN-103869623-B | Coating composition | 默克专利有限公司 | 2017-07-21 | — | — | CN | disclosed |
| CN-106795384-A | Carbon coated metallic particles, article and the purposes being dispersed through | 柯达公司 | 2017-05-31 | — | — | CN | disclosed |
| EP-2273968-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2011-01-19 | — | — | EP | disclosed |
| WO-2009140076-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2009-11-19 | — | — | WO | disclosed |