SCHEMBL1025545

SCHEMBL1025545

O=C=Nc1ccccc1.O=C=Nc1ccccc1.O=C=Nc1ccccc1.O=P(O)(O)S

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.43
CA4 P22748 1/20 0.43
CA5A P35218 1/20 0.43
CYP3A4 P08684 4/20 0.42
TSHR P16473 2/20 0.42
MIF P14174 1/20 0.41
ALOX15 P16050 1/20 0.41
CFTR P13569 1/20 0.39
ALDH1A1 P00352 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
MAPK1 P28482 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
SRC P12931 2/20 0.34
PTPN1 P18031 1/20 0.33
TRPA1 O75762 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphoric Acid SCHEMBL55726 0.91 CA2 (0.46) CA2CA4CA5ACYP3A4TSHR
Phosphoric Acid SCHEMBL28558146 0.91 CA2 (0.46) CA2CA4CA5ACYP3A4TSHR
SCHEMBL169930 0.85 MIF (0.48) CA2CA4CA5ACYP3A4TSHR
SCHEMBL27453541 0.85 MIF (0.48) CA2CA4CA5ACYP3A4TSHR
SCHEMBL1162826 0.85 CYP3A4 (0.46) CYP3A4TSHRMIFALDH1A1MEN1
SCHEMBL245090 0.84 MIF (0.55) CYP3A4TSHRMIFALDH1A1MEN1
SCHEMBL5925 0.84
SCHEMBL1332539 0.84
Benzene SCHEMBL11510532 0.84 MIF (0.55) CYP3A4TSHRMIFALDH1A1MEN1
SCHEMBL19459346 0.84 MIF (0.55) CYP3A4TSHRMIFALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023120633-A1 WIPER DEVICE キヤノン株式会社 2023-06-29 WO claimed
WO-2022255184-A1 CLEANING MEMBER AND ELASTIC MEMBER キヤノン株式会社 2022-12-08 WO claimed
US-11945414-B2 Vehicle windshield wiper blade CANON KABUSHIKI KAISHA (JP) 2024-04-02 US disclosed
US-20230259062-A1 ELECTROPHOTOGRAPHY CLEANING BLADE, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC IMAGE FORMATION DEVICE CANON KABUSHIKI KAISHA (JP) 2023-08-17 US disclosed
WO-2023120633-A1 WIPER DEVICE キヤノン株式会社 2023-06-29 WO disclosed
EP-4190835-A1 WIPER BLADE FOR VEHICLE CANON KABUSHIKI KAISHA (JP) 2023-06-07 EP disclosed
EP-4190216-A1 WIPER BLADE FOR CLEANING CANON KABUSHIKI KAISHA (JP) 2023-06-07 EP disclosed
US-20230159001-A1 VEHICLE WINDSHIELD WIPER BLADE CANON KABUSHIKI KAISHA (JP) 2023-05-25 US disclosed
US-20230157493-A1 WIPER BLADE CANON KABUSHIKI KAISHA (JP) 2023-05-25 US disclosed
WO-2022255184-A1 CLEANING MEMBER AND ELASTIC MEMBER キヤノン株式会社 2022-12-08 WO disclosed
US-8013084-B2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2011-09-06 US disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed
US-20040147708-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
US-20040122201-A1 polysulfides; improved impact resistance MITSUBISHI GAS CHEMICAL COMPANY (JP) 2004-06-24 US disclosed
EP-1426392-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-09 EP disclosed
EP-1398317-A1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-03-17 EP disclosed
US-20040024165-A1 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-02-05 US disclosed
EP-1378535-A1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-01-07 EP disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed