Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | DPP4 | P27487 | 2/20 | 0.33 |
| ▸ | DPP8 | Q6V1X1 | 4/20 | 0.33 |
| ▸ | DPP9 | Q86TI2 | 4/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15043153 | 0.88 | CYP17A1 (0.33) | ALDH1A1CYP17A1CYP19A1KMT2ASMN1; SMN2 | |
| SCHEMBL12309610 | 0.88 | DPP8 (0.31) | DPP8DPP9CYP17A1CYP19A1 | |
| SCHEMBL17773368 | 0.84 | ALDH1A1 (0.34) | ALDH1A1CYP17A1CYP19A1KMT2ASMN1; SMN2 | |
| SCHEMBL10224665 | 0.84 | DPP8 (0.33) | ALDH1A1DPP8DPP9CYP17A1CYP19A1 | |
| SCHEMBL15268375 | 0.83 | CYP17A1 (0.35) | ALDH1A1DPP4CYP17A1CYP19A1KMT2A | |
| SCHEMBL10259092 | 0.83 | CYP17A1 (0.31) | CYP17A1CYP19A1 | |
| SCHEMBL17853812 | 0.82 | CYP17A1 (0.34) | ALDH1A1DPP4CYP17A1CYP19A1KMT2A | |
| SCHEMBL14226581 | 0.82 | CYP17A1 (0.32) | ALDH1A1CYP17A1CYP19A1 | |
| SCHEMBL10259712 | 0.82 | DPP4 (0.31) | DPP4CYP17A1CYP19A1 | |
| SCHEMBL10224664 | 0.81 | CYP17A1 (0.31) | CYP17A1CYP19A1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-9057948-B2 | Resist composition for EUV or EB, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-20130157194-A1 | PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130143159-A1 | RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| US-8377625-B2 | Method for producing a copolymer solution with a uniform concentration for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8211615-B2 | Copolymer for immersion lithography and compositions | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-7960494-B2 | Copolymer for semiconductor lithography and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20100143842-A1 | METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100047710-A1 | COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090306328-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2009-12-10 | — | — | US | disclosed |