Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | PRKCA | P17252 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10224665 | 0.84 | DPP8 (0.33) | CYP17A1CYP19A1MEN1KMT2A | |
| SCHEMBL19842052 | 0.82 | — | — | |
| SCHEMBL15043153 | 0.82 | CYP17A1 (0.33) | CYP17A1CYP19A1KMT2A | |
| SCHEMBL10259463 | 0.81 | EPHX2 (0.34) | CYP17A1CYP19A1KMT2ALMNA | |
| SCHEMBL17773368 | 0.81 | ALDH1A1 (0.34) | CYP17A1CYP19A1KMT2A | |
| SCHEMBL16724514 | 0.81 | PRKCA (0.35) | CYP17A1CYP19A1PRKCAKMT2A | |
| SCHEMBL15268375 | 0.80 | CYP17A1 (0.35) | CYP17A1CYP19A1KMT2A | |
| SCHEMBL10224667 | 0.80 | DPP8 (0.33) | CYP17A1CYP19A1 | |
| SCHEMBL17853812 | 0.79 | CYP17A1 (0.34) | CYP17A1CYP19A1KMT2A | |
| SCHEMBL14226581 | 0.79 | CYP17A1 (0.32) | CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9885956-B2 | Pattern forming method, and, electronic device producing method and electronic device, each using the same | FUJIFILM CORPORATION (JP) | 2018-02-06 | — | — | US | disclosed |
| US-20150140482-A1 | PATTERN FORMING METHOD, AND, ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-05-21 | — | — | US | disclosed |
| US-8771921-B2 | Negative resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-08 | — | — | US | disclosed |
| US-8404426-B2 | Negative resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20120164581-A1 | NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | SHO ABE (JP) | 2012-06-28 | — | — | US | disclosed |
| US-7820360-B2 | Polymer compound, negative resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-26 | — | — | US | disclosed |
| US-20100035178-A1 | Negative resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. | 2010-02-11 | — | — | US | disclosed |
| US-20090162785-A1 | POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |