Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CBFB | Q13951 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | ADAMTS5 | Q9UNA0 | 1/20 | 0.31 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.31 |
| ▸ | PDE2A | O00408 | 1/20 | 0.31 |
| ▸ | PDE3B | Q13370 | 1/20 | 0.31 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.31 |
| ▸ | P2RY12 | Q9H244 | 1/20 | 0.31 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.30 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28270232 | 0.98 | CBFB (0.36) | CBFBKDM4EMAPTMAPK1ADAMTS5 | |
| Water SCHEMBL11194639 | 0.94 | CBFB (0.34) | CBFBKDM4EMAPTMAPK1 | |
| SCHEMBL1021251 | 0.79 | KDM4E (0.37) | KDM4EMAPTADORA3ADORA2A | |
| SCHEMBL21563201 | 0.79 | — | — | |
| SCHEMBL1019781 | 0.79 | MAPT (0.46) | MAPT | |
| SCHEMBL1020657 | 0.79 | GRM4 (0.33) | PDE3BPDE3A | |
| SCHEMBL3259924 | 0.79 | — | — | |
| SCHEMBL25672720 | 0.79 | HRH4 (0.35) | EGLN1 | |
| SCHEMBL8622721 | 0.79 | ADRB2 (0.33) | KDM4EADORA3ADORA2A | |
| SCHEMBL1426962 | 0.79 | GRM4 (0.33) | MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 351 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630744-B2 | Polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-05-19 | — | — | US | claimed |
| CN-122038059-A | Cleaning composition for removing post-etch residues | 恩特格里斯公司 | 2026-05-15 | — | — | CN | claimed |
| US-12590224-B2 | Chemical mechanical polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-03-31 | — | — | US | claimed |
| EP-4688987-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| EP-4653506-A1 | CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2025-11-26 | — | — | EP | claimed |
| EP-4647474-A2 | CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A., Inc. (US) | 2025-11-12 | — | — | EP | claimed |
| US-20250333622-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-10-30 | — | — | US | claimed |
| EP-4626996-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2025-10-08 | — | — | EP | claimed |
| US-12398291-B2 | Polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-08-26 | — | — | US | claimed |
| US-12371589-B2 | Polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-07-29 | — | — | US | claimed |
| EP-1051888-B1 | PROCESS AND SOLUTION FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES | ATOTECH DEUTSCHLAND GMBH (DE) | 2002-03-27 | — | — | EP | claimed |
| EP-1055355-B1 | PROCESS FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES | ATOTECH DEUTSCHLAND GMBH (DE) | 2001-12-05 | — | — | EP | claimed |
| EP-1055355-A1 | PROCESS FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES | ATOTECH Deutschland GmbH (DE) | 2000-11-29 | — | — | EP | claimed |
| EP-1051888-A1 | PROCESS AND SOLUTION FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES | ATOTECH Deutschland GmbH (DE) | 2000-11-15 | — | — | EP | claimed |
| WO-1999040764-A1 | PROCESS AND SOLUTION FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES | ATOTECH DEUTSCHLAND GMBH (DE) | 1999-08-12 | — | — | WO | claimed |
| WO-1999040765-A1 | PROCESS FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES | ATOTECH DEUTSCHLAND GMBH (DE) | 1999-08-12 | — | — | WO | claimed |
| EP-0371522-A1 | Use of a curing catalyst in the preparation of a powder coating composition | DSM N.V. (NL) | 1990-06-06 | — | — | EP | claimed |
| EP-0151813-B1 | A PROCESS FOR PHOSPHATIZING AND USE THEREOF | HENKEL CORPORATION (a Delaware corp.) (US) | 1990-05-02 | — | — | EP | claimed |
| US-4540442-A | ALKANOLAMINE, CARBOXYLIC ACID, TRIAZOLE | AMCHEM PRODUCTS, INC. (US) | 1985-09-10 | — | — | US | claimed |
| EP-0151813-A2 | A process for phosphatizing and use thereof | HENKEL CORPORATION (a Delaware corp.) (US) | 1985-08-21 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12590224-B2 | Chemical mechanical polishing compositions and methods of use thereof | PHOSPHO1, ACP1, PLEC | CBFB 2303/4885KDM4E 1188/4885MAPT 2861/4885 |
| US-12630744-B2 | Polishing compositions and methods of use thereof | ZAP70, PRKDC, PEAK1 | CBFB 758/4885KDM4E 129/4885MAPT 2759/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.