Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1B1 | Q16678 | 16/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | POLB | P06746 | 2/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | MEN1 | O00255 | 1/20 | 0.56 |
| ▸ | NPC1 | O15118 | 1/20 | 0.56 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 1/20 | 0.56 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.56 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.54 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.52 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.52 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.52 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.52 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.52 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.52 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.52 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.52 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21988061 | 0.88 | CYP1B1 (0.58) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL10267904 | 0.84 | ALDH1A1 (0.60) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL22164834 | 0.83 | CYP1B1 (0.65) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL29936324 | 0.83 | CYP1B1 (0.65) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL30149986 | 0.82 | CYP1B1 (0.67) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL2112047 | 0.82 | CYP1B1 (0.67) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL10267887 | 0.82 | CYP1B1 (0.68) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL10267896 | 0.81 | MEN1 (0.61) | ALDH1A1KDM4EMEN1MAPTKMT2A | |
| SCHEMBL10262375 | 0.81 | CYP1B1 (0.60) | CYP1B1ALDH1A1POLBKDM4EMEN1 | |
| SCHEMBL29493708 | 0.80 | CYP1B1 (0.68) | CYP1B1ALDH1A1POLBKDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |