Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 11/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 9/20 | 0.47 |
| ▸ | HPGD | P15428 | 7/20 | 0.47 |
| ▸ | MAPT | P10636 | 5/20 | 0.47 |
| ▸ | MEN1 | O00255 | 4/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 4/20 | 0.47 |
| ▸ | GAA | P10253 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.41 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 3/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | RAB9A | P51151 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28213214 | 0.85 | ALDH1A1 (0.47) | ALDH1A1KDM4EHPGDMAPTMEN1 | |
| SCHEMBL20466119 | 0.74 | KDM4E (0.48) | ALDH1A1KDM4EHPGDMAPTKMT2A | |
| SCHEMBL6749506 | 0.73 | ALDH1A1 (0.39) | ALDH1A1KDM4EHPGDHSD17B10CYP3A4 | |
| SCHEMBL28382420 | 0.73 | KDM4E (0.31) | ALDH1A1KDM4ESMN1; SMN2 | |
| SCHEMBL10955825 | 0.72 | ALDH1A1 (0.45) | ALDH1A1KDM4EHPGDMAPTMEN1 | |
| SCHEMBL18499935 | 0.72 | KMT2A (0.68) | ALDH1A1KDM4EHPGDMAPTMEN1 | |
| SCHEMBL2553765 | 0.70 | ALDH1A1 (0.48) | ALDH1A1KDM4EHPGDMAPTMEN1 | |
| SCHEMBL29777501 | 0.70 | ALDH1A1 (0.48) | ALDH1A1KDM4EHPGDMAPTMEN1 | |
| SCHEMBL19328140 | 0.69 | ALDH1A1 (0.35) | ALDH1A1HPGDHSD17B10CYP3A4POLB | |
| SCHEMBL5372884 | 0.69 | TYMS (0.65) | ALDH1A1KDM4EHPGDMAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025022873-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM | 東レ株式会社 | 2025-01-30 | — | — | WO | disclosed |
| CN-117859098-A | Photosensitive resin composition and microlens | 东丽株式会社 | 2024-04-09 | — | — | CN | disclosed |
| US-20240045329-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2024-02-08 | — | — | US | disclosed |
| US-11650499-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| WO-2023054226-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MICROLENS | 東レ株式会社 | 2023-04-06 | — | — | WO | disclosed |
| US-11599023-B2 | Photosensitive resin composition, organic EL element barrier rib, and organic EL element | SHOWA DENKO K.K. (JP) | 2023-03-07 | — | — | US | disclosed |
| EP-3369780-B1 | METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME | TORAY INDUSTRIES (JP) | 2022-10-26 | — | — | EP | disclosed |
| US-20220275241-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL | SHOWA DENKO K.K. (JP) | 2022-09-01 | — | — | US | disclosed |
| WO-2022163335-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | 東レ株式会社 | 2022-08-04 | — | — | WO | disclosed |
| EP-3018532-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED BY CURING SAME, AND OPTICAL DEVICE EQUIPPED WITH SAME | Toray Industries, Inc. (JP) | 2016-05-11 | — | — | EP | disclosed |
| CN-105359037-A | Positive photosensitive resin composition, cured film formed by curing same, and optical device equipped with same | TORAY INDUSTRIES | 2016-02-24 | — | — | CN | disclosed |
| CN-102667625-B | Positive type photosensitive organic compound, the cured film formed by said composition and there is the element of cured film | TORAY INDUSTRIES, INC. (JP) | 2015-11-25 | — | — | CN | disclosed |
| US-8828642-B2 | Positive photosensitive resin composition, cured film obtained using same, and optical device | TORAY INDUSTRIES, INC. (JP) | 2014-09-09 | — | — | US | disclosed |
| CN-102472964-B | Positive photosensitive resin composition, cured film obtained using same, and optical device | TORAY INDUSTRIES | 2013-08-07 | — | — | CN | disclosed |
| US-20120237873-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM | TORAY INDUSTRIES INC. (JP) | 2012-09-20 | — | — | US | disclosed |
| CN-102667625-A | Positive photosensitive resin composition, cured film formed from the same, and device having cured film | TORAY INDUSTRIES | 2012-09-12 | — | — | CN | disclosed |
| EP-2485091-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE | Toray Industries, Inc. (JP) | 2012-08-08 | — | — | EP | disclosed |
| US-20120178022-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM OBTAINED USING SAME, AND OPTICAL DEVICE | TORAY INDUSTRIES, INC. (JP) | 2012-07-12 | — | — | US | disclosed |
| CN-102472964-A | Positive photosensitive resin composition, cured film obtained using same, and optical device | TORAY INDUSTRIES | 2012-05-23 | — | — | CN | disclosed |