Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | PEPD | P12955 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1296117 | 0.82 | RAB9A (0.46) | TP53CYP3A4PEPDTAAR1 | |
| SCHEMBL26452014 | 0.81 | ADRB2 (0.40) | TP53CYP3A4PEPDALDH1A1LMNA | |
| SCHEMBL1196705 | 0.81 | RAB9A (0.45) | TP53CYP3A4PEPDTAAR1 | |
| SCHEMBL18232594 | 0.80 | TP53 (0.36) | TP53CYP3A4PEPDSMN1; SMN2 | |
| SCHEMBL18929756 | 0.79 | TP53 (0.41) | TP53CYP3A4PEPDTAAR1 | |
| SCHEMBL27540841 | 0.79 | TP53 (0.41) | TP53CYP3A4PEPDMEN1KMT2A | |
| SCHEMBL12974493 | 0.79 | TP53 (0.50) | TP53CYP3A4PEPDALDH1A1LMNA | |
| SCHEMBL28704490 | 0.78 | TP53 (0.40) | TP53CYP3A4PEPDTAAR1 | |
| Ethylene Glycol SCHEMBL1296750 | 0.78 | RAB9A (0.43) | TP53CYP3A4PEPDTAAR1 | |
| SCHEMBL18235961 | 0.78 | TP53 (0.35) | TP53CYP3A4PEPDALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2492747-A2 | Chemically amplified negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-08-29 | — | — | EP | disclosed |