SCHEMBL10312346

SCHEMBL10312346

O=[N+]([O-])c1ccccc1S(=O)(=O)N(CCC[Si](CO)(CO)CO)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.52
KMT2A Q03164 5/20 0.49
TDP1 Q9NUW8 1/20 0.49
ALDH1A1 P00352 2/20 0.48
CYP2D6 P10635 1/20 0.48
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
MEN1 O00255 3/20 0.45
NPC1 O15118 1/20 0.45
MAPT P10636 1/20 0.44
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP13 P45452 1/20 0.40
ESR1 P03372 1/20 0.40
PTPN1 P18031 2/20 0.39
S1PR4 O95977 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16975882 0.85 NPSR1 (0.56) NPSR1KMT2ATDP1ALDH1A1CYP2D6
SCHEMBL15702327 0.83 NPSR1 (0.51) NPSR1KMT2ATDP1ALDH1A1CYP2D6
SCHEMBL24628765 0.79 NPSR1 (0.59) NPSR1KMT2ATDP1ALDH1A1CYP2D6
SCHEMBL10312350 0.79 MEN1 (0.46) NPSR1KMT2AALDH1A1MEN1MAPT
SCHEMBL10312364 0.79 NR1I2 (0.56) ESR1LMNA
SCHEMBL11887706 0.76 NPSR1 (0.62) NPSR1KMT2ATDP1ALDH1A1CYP2D6
SCHEMBL6111591 0.76 S1PR4 (0.62) NPSR1KMT2ATDP1ALDH1A1CYP2D6
SCHEMBL409365 0.76 NPSR1 (0.53) NPSR1KMT2ATDP1ALDH1A1CYP2D6
SCHEMBL10312352 0.76 ESR1 (0.43) KMT2AALDH1A1MEN1MMP2MMP9
SCHEMBL16499801 0.75 KMT2A (0.57) NPSR1KMT2ATDP1ALDH1A1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 NPSR1 3328/4885KMT2A 23/4885TDP1 2589/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.