SCHEMBL10312352

SCHEMBL10312352

CS(=O)(=O)N(CCC[Si](CO)(CO)CO)c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
NR1I2 O75469 3/20 0.43
KMT2A Q03164 5/20 0.41
TSHR P16473 2/20 0.41
MEN1 O00255 2/20 0.41
LMNA P02545 2/20 0.41
PER2 O15055 1/20 0.41
MAPK1 P28482 1/20 0.41
CRY1 Q16526 1/20 0.41
CRY2 Q49AN0 1/20 0.41
ALDH1A1 P00352 1/20 0.40
MMP2 P08253 1/20 0.38
MMP9 P14780 1/20 0.38
GAA P10253 2/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10312364 0.85 NR1I2 (0.56) ESR1NR1I2LMNA
SCHEMBL10312353 0.83 PER2 (0.47) SMN1; SMN2NR1I2KMT2AMEN1LMNA
SCHEMBL15702432 0.80 HTT (0.41) ESR1SMN1; SMN2KMT2ATSHRMEN1
SCHEMBL27754450 0.80 SMN1; SMN2 (0.47) ESR1SMN1; SMN2KMT2ATSHRMEN1
SCHEMBL14820 0.78 ESR1 (0.60) ESR1SMN1; SMN2NR1I2KMT2ATSHR
SCHEMBL14735895 0.77 ESR1 (0.44) ESR1SMN1; SMN2NR1I2KMT2ATSHR
SCHEMBL4483031 0.77 ESR1 (0.55) ESR1SMN1; SMN2NR1I2KMT2ATSHR
SCHEMBL9131891 0.76 ESR1 (0.43) ESR1SMN1; SMN2KMT2ATSHRMEN1
SCHEMBL10312346 0.76 NPSR1 (0.52) ESR1KMT2AMEN1LMNAALDH1A1
SCHEMBL17333618 0.74 ESR1 (0.58) ESR1SMN1; SMN2KMT2ATSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 ESR1 2543/4885SMN1; SMN2 3570/4885NR1I2 3866/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.