SCHEMBL10312482

SCHEMBL10312482

NCCNCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.54

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 4/20 0.54
GRIN3B O60391 4/20 0.54
GRIN1 Q05586 4/20 0.54
GRIN2A Q12879 4/20 0.54
GRIN2B Q13224 4/20 0.54
GRIN2C Q14957 4/20 0.54
GRIN3A Q8TCU5 4/20 0.54
KMT2A Q03164 3/20 0.53
MEN1 O00255 2/20 0.53
ALDH1A1 P00352 1/20 0.48
TSHR P16473 1/20 0.48
EPHX2 P34913 9/20 0.47
P2RX7 Q99572 1/20 0.41
HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26687425 0.88 MEN1 (0.59) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
Bromide SCHEMBL29519978 0.87 MEN1 (0.62) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL25475060 0.78 KMT2A (0.49) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL21724708 0.78 EPHX2 (0.50) KMT2AMEN1ALDH1A1TSHREPHX2
SCHEMBL9289043 0.78 KMT2A (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL28222413 0.78 KMT2A (0.61) KMT2AMEN1ALDH1A1TSHREPHX2
Hydrochloric Acid SCHEMBL27551919 0.77 KMT2A (0.51) KMT2AMEN1ALDH1A1TSHREPHX2
Hydrochloric Acid SCHEMBL1072535 0.77 KMT2A (0.50) KMT2AMEN1ALDH1A1TSHREPHX2
SCHEMBL26687399 0.76 KMT2A (0.64) KMT2AMEN1ALDH1A1TSHREPHX2
SCHEMBL20710010 0.75 MEN1 (0.50) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
EP-2479615-B1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL IND LTD (JP) 2014-04-23 EP disclosed
EP-2479615-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM Nissan Chemical Industries, Ltd. (JP) 2012-07-25 EP disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 GRIN2D 3248/4885GRIN3B 4208/4885GRIN1 3137/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.