⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11766565 | 0.79 | — | — | |
| SCHEMBL16597273 | 0.79 | APEX1 (0.35) | — | |
| SCHEMBL16597263 | 0.72 | CHRM2 (0.32) | — | |
| SCHEMBL36462 | 0.71 | L3MBTL1 (0.35) | — | |
| SCHEMBL13073358 | 0.70 | — | — | |
| SCHEMBL1020051 | 0.68 | L3MBTL1 (0.38) | — | |
| SCHEMBL6938330 | 0.68 | KMT2A (0.32) | — | |
| SCHEMBL16592866 | 0.68 | SORT1 (0.33) | — | |
| SCHEMBL11363843 | 0.67 | L3MBTL1 (0.32) | — | |
| SCHEMBL11365049 | 0.67 | L3MBTL1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2474565-A1 | CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-11 | — | — | EP | disclosed |