SCHEMBL1031390

SCHEMBL1031390

CC(C)(C)C(=O)C(F)C(=O)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11657729 0.77
SCHEMBL333428 0.76 CA2 (0.33)
SCHEMBL21515215 0.76 ALDH1A1 (0.33)
SCHEMBL1034296 0.76
Fluoride SCHEMBL9935043 0.75
SCHEMBL28036277 0.74 CA2 (0.32)
SCHEMBL28244021 0.74 CA2 (0.32)
Acetic Acid SCHEMBL30746801 0.70 FFAR3 (0.39)
SCHEMBL7924307 0.69
SCHEMBL8207672 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 228 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12467147-B2 Vapor cleaning of substrate surfaces LAM RESEARCH CORPORATION (US) 2025-11-11 US claimed
EP-4608930-A1 INORGANIC-ORGANIC HYBRID NANOPARTICLES WITH IMPROVED ENERGY TRANSFER PROPERTIES Nanomnia Srl (IT) 2025-09-03 EP claimed
WO-2024089630-A1 INORGANIC-ORGANIC HYBRID NANOPARTICLES WITH IMPROVED ENERGY TRANSFER PROPERTIES NANOMNIA S.R.L. (IT) 2024-05-02 WO claimed
EP-4352275-A1 ETCHING OF ALKALI METAL COMPOUNDS Applied Materials, Inc. (US) 2024-04-17 EP claimed
CN-117716063-A Etching of alkali metal compounds 应用材料公司 2024-03-15 CN claimed
US-11926903-B2 Etching of alkali metal compounds APPLIED MATERIALS, INC. (US) 2024-03-12 US claimed
CN-111479628-B Moisture-curable composition 科思创德国股份有限公司 2024-03-08 CN claimed
EP-4294961-A1 METAL OXYFLUORIDE FILM FORMATION METHODS Applied Materials, Inc. (US) 2023-12-27 EP claimed
US-11834545-B2 Moisture-curing compositions COVESTRO DEUTSCHLAND AG (DE) 2023-12-05 US claimed
CN-117062939-A Method for forming metal oxyfluoride film 应用材料公司 2023-11-14 CN claimed
CN-102473475-A Conductive fine particle dispersion, photocurable composition containing conductive fine particles, and cured film containing conductive fine particles DAINIPPON TORYO KK 2012-05-23 CN claimed
US-20110037036-A1 DISPERSION, COMPOSITION FOR TRANSPARENT ELECTROCONDUCTIVE FILM FORMATION, TRANSPARENT ELECTROCONDUCTIVE FILM, AND DISPLAY DAI NIPPON TORYO CO., LTD. (JP) 2011-02-17 US claimed
CN-101978430-A Dispersion liquid, composition for forming transparent conductive film, and display DAINIPPON TORYO KK 2011-02-16 CN claimed
US-20100068482-A1 Zirconium Oxide Dispersion, Photo-curing Composition Containing Zirconium Oxide Particle, and Cured Film DAI NIPPON TORYO CO., LTD. (JP) 2010-03-18 US claimed
EP-2093195-A1 ZIRCONIUM OXIDE PARTICLE DISPERSION LIQUID, ZIRCONIUM OXIDE PARTICLE-CONTAINING PHOTOHARDENING COMPOSITION, AND HARDENED FILM Dai Nippon Toryo Co., Ltd. (JP) 2009-08-26 EP claimed
CN-101158688-A Improved solid phase fluorescent immunizing detecting method RUIGAO ZHANG (CN) 2008-04-09 CN claimed
US-6030840-A CONTACTING CHELATED LANTHANIDE METAL IONS BOUND TO MARKER WITH BUFFERED SOLUTION OF DETERGENT, ENHANCER REAGENT AND POLYANION; IONS DISSOCIATE FROM MARKER AND REASSOCIATE WITH ENHANCER; THEN DETERMINING AMOUNT OF IONS LIBERATED NEN LIFE SCIENCES, INC. (US) 2000-02-29 US claimed
WO-1999066333-A1 NEUTRAL ENHANCEMENT OF LANTHANIDES FOR TIME RESOLVED FLUORESCENCE NEN LIFE SCIENCE PRODUCTS, INC. (US) 1999-12-23 WO claimed
US-5316909-A Quantitative analysis WALLAC OY (FI) 1994-05-31 US claimed
WO-1992016840-A1 LANTHANID FLUORESCENCE ASSAY OY DATACITY CENTER AB (FI) 1992-10-01 WO claimed