SCHEMBL10320564

SCHEMBL10320564

OCc1c(O)c(-c2ccccc2O)c(CO)c(CO)c1CO

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.45
HPGD P15428 2/20 0.45
HSD17B10 Q99714 2/20 0.45
BCL2L1 Q07817 1/20 0.45
GCGR P47871 2/20 0.41
ERBB2 P04626 1/20 0.41
PIM1 P11309 1/20 0.41
HKDC1 Q2TB90 1/20 0.41
HDAC4 P56524 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
MAPT P10636 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
KDM4E B2RXH2 1/20 0.35
NPC1 O15118 1/20 0.35
CA12 O43570 1/20 0.35
GMNN O75496 1/20 0.35
EGFR P00533 1/20 0.35
CA2 P00918 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10319055 0.90 ALDH1A1 (0.50) ALDH1A1HPGDHSD17B10BCL2L1GCGR
SCHEMBL10321647 0.78 ALDH1A1 (0.44) ALDH1A1HPGDHSD17B10BCL2L1GCGR
SCHEMBL10320519 0.75 ERBB2 (0.43) ALDH1A1HPGDHSD17B10BCL2L1GCGR
SCHEMBL10320912 0.75 MAOA (0.40) ALDH1A1HPGDHSD17B10BCL2L1GCGR
SCHEMBL30639406 0.74 ALDH1A1 (0.39) ALDH1A1HPGDHSD17B10BCL2L1GCGR
SCHEMBL29883912 0.73 MEN1 (0.55) ALDH1A1HPGDHSD17B10ERBB2PIM1
SCHEMBL30397720 0.73 ALDH1A1 (0.55) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
SCHEMBL1980808 0.73 ALDH1A1 (0.55) ALDH1A1HPGDHSD17B10BCL2L1HDAC4
SCHEMBL4748926 0.71 ALDH1A1 (0.48) ALDH1A1HPGDHSD17B10BCL2L1MAPT
SCHEMBL7553964 0.69 ALDH1A1 (0.46) ALDH1A1HPGDHSD17B10BCL2L1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240004296-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2024-01-04 US disclosed
US-20230359123-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-11-09 US disclosed
US-20230259031-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
US-20230161246-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-05-25 US disclosed
US-20220155686-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
WO-2020184642-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2020-09-17 WO disclosed
US-9244353-B2 Resist underlayer film forming composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-01-26 US disclosed
US-20150212418-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-07-30 US disclosed
US-9090119-B2 Pattern forming method JSR CORPORATION (JP) 2015-07-28 US disclosed
US-20140224765-A1 PATTERN FORMING METHOD JSR CORPORATION (JP) 2014-08-14 US disclosed
US-8715916-B2 Pattern forming method and resist underlayer film-forming composition JSR CORPORATION (JP) 2014-05-06 US disclosed
US-20120181251-A1 PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed