SCHEMBL10330620

SCHEMBL10330620

CCOCC(C)(COC)OC

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
TSHR P16473 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19546008 0.87 ALDH1A1 (0.32) ALDH1A1TSHRTDP1
SCHEMBL13397713 0.84 ALDH1A1 (0.38) ALDH1A1TSHRTDP1
SCHEMBL9094344 0.76
SCHEMBL10017804 0.74
SCHEMBL18023107 0.74 TSHR (0.34) TSHR
SCHEMBL18104667 0.72 ALDH1A1 (0.33) ALDH1A1TSHRTDP1
SCHEMBL16076737 0.70
SCHEMBL12697346 0.70
SCHEMBL13067255 0.70
SCHEMBL12069856 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120183892-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed