⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2608664 | 0.90 | ALDH1A1 (0.32) | — | |
| SCHEMBL4986973 | 0.88 | ALDH1A1 (0.33) | — | |
| SCHEMBL1561508 | 0.85 | LMNA (0.41) | — | |
| SCHEMBL17771329 | 0.85 | — | — | |
| SCHEMBL937165 | 0.82 | ALDH1A1 (0.33) | — | |
| SCHEMBL18023107 | 0.78 | TSHR (0.34) | — | |
| SCHEMBL18635982 | 0.78 | TSHR (0.35) | — | |
| SCHEMBL1561949 | 0.77 | TSHR (0.33) | — | |
| SCHEMBL10447692 | 0.77 | TSHR (0.33) | — | |
| SCHEMBL16330325 | 0.76 | TSHR (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160354476-A1 | TARGETED THERAPEUTIC NUCLEOSIDES AND THEIR USE | IONIS PHARMACEUTICALS, INC. (US) | 2016-12-08 | — | — | US | disclosed |
| US-9207534-B2 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-08 | — | — | US | disclosed |
| US-9162967-B2 | Sulfonium salt, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-8859181-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8808964-B2 | Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8778591-B2 | — | — | 2014-07-15 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120052441-A1 | NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20110212390-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |