SCHEMBL10344804

SCHEMBL10344804

COc1ccc(ON2CCOCC2)cc1

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.56
ALDH1A1 P00352 5/20 0.53
KDM4E B2RXH2 1/20 0.53
USP2 O75604 1/20 0.53
HSD17B10 Q99714 1/20 0.53
KMT2A Q03164 2/20 0.51
MEN1 O00255 1/20 0.51
FKBP1A P62942 2/20 0.49
GAA P10253 2/20 0.49
POLB P06746 1/20 0.49
AKR1C3 P42330 1/20 0.49
MAPT P10636 1/20 0.49
HPGD P15428 1/20 0.49
APOBEC3G Q9HC16 1/20 0.49
BLM P54132 1/20 0.49
CYP2D6 P10635 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3164216 0.79 ALDH1A1 (0.52) SMN1; SMN2ALDH1A1KDM4EGAAPOLB
SCHEMBL7472860 0.79 KMT2A (0.49) SMN1; SMN2ALDH1A1KDM4EHSD17B10KMT2A
SCHEMBL2208450 0.78 AKR1C3 (0.68) SMN1; SMN2ALDH1A1KDM4EUSP2HSD17B10
SCHEMBL2095095 0.78 CA1 (0.46) SMN1; SMN2ALDH1A1KDM4EPOLBMAPT
SCHEMBL4719481 0.76 SMN1; SMN2 (0.36) SMN1; SMN2ALDH1A1KDM4EUSP2HSD17B10
SCHEMBL4349056 0.76 AKR1C3 (0.66) SMN1; SMN2ALDH1A1KDM4EUSP2HSD17B10
SCHEMBL16695922 0.74 MAPT (0.50) SMN1; SMN2ALDH1A1KDM4EUSP2KMT2A
1,4-Dimethoxybenzene SCHEMBL29157786 0.73 CA1 (0.58) SMN1; SMN2ALDH1A1KDM4EUSP2HSD17B10
SCHEMBL18415522 0.73 AKR1C3 (0.62) SMN1; SMN2ALDH1A1KDM4EUSP2HSD17B10
Nitrogen SCHEMBL7794313 0.73 AKR1C3 (0.62) SMN1; SMN2ALDH1A1KDM4EUSP2HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0194704-B1 PROCESS FOR THE FORMATION OF LINEWORK OR HALFTONE MULTICOLOUR COLLOID PATTERNS AGFA-GEVAERT N.V. (BE) 1990-03-28 EP disclosed
US-4710444-A Process for the formation of linework or halftone multicolor colloid patterns AGFA-GEVAERT N.V. (BE) 1987-12-01 US disclosed
US-4390612-A Colloid relief images formed by oxidized developer transfer MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-06-28 US disclosed
US-4367279-A Silver halide complexing agents of sulfones, nitriles, and onium salts EASTMAN KODAK COMPANY (US) 1983-01-04 US disclosed
US-4363864-A Colloid relief images by oxidized developer transfer MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-12-14 US disclosed